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[pdf]Analysis of Epichlorohydrin Dissolved from Metal Food Cans by GC
A RESTEK Rtx-WAX (30 mL, 0.53 mm ID, 1 μm film thickness) was used. The carrier gas flowrate was set so that epichlorohydrin would elute in about 7 minutes.
(1089 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12939/g272.pdf
(1089 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12939/g272.pdf

[pdf]untitled
Restek Rtx-Wax column (internal diameter 0.25 mm, length 30 m, film thickness 0.5 μ m). The pretreatment method is shown in the flow chart of Fig. 2. ■ Analysis Method (Polystyrene Polymer
(251 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12400/g267.pdf
(251 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12400/g267.pdf

[pdf]ApplicationNews
Column : RESTEK Rtx-WAX (60 m × 0.53 mm I.D., df = 1.0 µm) Column Temp. : 80 ˚C - 5 ˚C/min - 130 ˚C - 15 ˚C/min - 230 ˚C (3 min) Det. Temp. : 240 ˚C Discharge Gas : 50 mL/min (He) Glass
(1656 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12150/jpc114130.pdf
(1656 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12150/jpc114130.pdf

[pdf]G264_01_E_091217.eps
An Rtx-WAX column (30 m 0.25 mm I.D. 0.25 µ m) was used for the analysis, and the standard-addition sample was analyzed by GC/FID and GC/FTD. The sample preparation flow diagram is shown in Fig. 2,
(1271 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12402/g264.pdf
(1271 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12402/g264.pdf

[pdf]Microsoft PowerPoint - AP_DataSheet_GCMS26.ppt [互換モード]
2nd Rtx-WAX (2.5 mL. x 0.1 mmI.D., 0.1 µm) Injection quantity : 0.5µL Injection mode : Split (split ratio 50) Vaporization chamber temperature : 275℃ Column oven temperature: 40 ℃ -> (1.8 ℃ /min) ->
(135 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12879/jpo212081.pdf
(135 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12879/jpo212081.pdf

[pdf]Microsoft PowerPoint - AP_DataSheet_gcms16.ppt [互換モード]
2nd Rtx-WAX (2.5 mL. x 0.1 mmI.D., 0.1 µm)Injection quantity : 0.5µLInjection quantity : Split (split ratio 50)Vaporization chamber temperature : 275℃Column oven temperature: 40 ℃ -> (1.8 ℃ /min) ->
(397 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12880/jpo212071.pdf
(397 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12880/jpo212071.pdf

[pdf]Microsoft PowerPoint - LAAN-E-MS-E005.ppt
(15 mL. × 0.25 mmI.D., 1.0 µm) 2nd Rtx-WAX (2.5 mL. × 0.1 mmI.D., 0.1 µm) Injection quantity : 0.5µL Injection quantity : Split (split ratio 50) Vaporization chamber temperature : 275℃
(201 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12908/jpo212060.pdf
(201 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12908/jpo212060.pdf

[pdf]Microsoft PowerPoint - AP_DataSheet_GCMS27.ppt [互換モード]
2nd Rtx-WAX (2.5 mL. x 0.1 mmI.D., 0.1 µm)Injection quantity : 1.0µLInjection mode : Split (split ratio 100)Vaporization chamber temperature : 250℃Column oven temperature: 40 ℃ (2 min) -> (
(129 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12930/jpo212082.pdf
(129 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/applications/application_note/12930/jpo212082.pdf

[pdf]GCxGC Kaffee
Zoex loop modula- tor. A 30 m Rtx-wax column with an internal diameter of 0.25 mm and a film thickness of 0.25 µm was used for separation in the first dimension. A deactivated Press
(231 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/journal/shimadzu_journal/11615/ego209001.pdf
(231 KB)www.shimadzu.com/an/sites/shimadzu.com.an/files/pim/pim_document_file/journal/shimadzu_journal/11615/ego209001.pdf

Confirmation of Reaction Mechanism Using 13CO2 (GCMS) : SHIMADZU (Shimadzu Corporation)
Column Rtx-WAX ®(Length: 60 m, 0.32 mm I.D., df=0.5 µm, RESTEK) [GC] [MS] Injection unit temperature 250 °C Interface temperature 250 °C Column oven temperature 70 °C → (10 °C/min) → 240 °C (5 min)
(42 KB)www.shimadzu.com/an/industries/new-energy/artificial-photosynthesis/confirmation-of-reaction-mechanism/index.html
(42 KB)www.shimadzu.com/an/industries/new-energy/artificial-photosynthesis/confirmation-of-reaction-mechanism/index.html